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TETRAKIS(ETHOXYETHOXY)SILANE

  • CAS：18407-94-8
  • purity：99%
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1.What is the TETRAKIS(ETHOXYETHOXY)SILANE ?

Used in Semiconductor Industry:
TETRAKIS(ETHOXYETHOXY)SILANE is used as a precursor for the production of silicon dioxide films, which are essential in the manufacturing of semiconductor devices due to their excellent adhesion and chemical stability.
Used in Optical Industry:
TETRAKIS(ETHOXYETHOXY)SILANE is used as a material for creating thin films with uniform and smooth surfaces, which are crucial for optical applications requiring high-quality film properties.
Used in Surface Modification:
TETRAKIS(ETHOXYETHOXY)SILANE is used as a surface modification agent to enhance the properties of various materials, improving their performance in different applications.
Used in Coatings, Adhesives, and Sealants:
TETRAKIS(ETHOXYETHOXY)SILANE is used as a component in the formulation of coatings, adhesives, and sealants, contributing to their excellent adhesion and chemical stability, making them suitable for various industrial applications.

2-ethoxy-ethanol
110-80-5

2-ethoxy-ethanol

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

Si(Oet-2-Oet)4
18407-94-8

Si(Oet-2-Oet)4

Conditions
Conditions Yield
94%
2-ethoxy-ethanol
110-80-5

2-ethoxy-ethanol

Si(Oet-2-Oet)4
18407-94-8

Si(Oet-2-Oet)4

C<sub>24</sub>H<sub>54</sub>O<sub>13</sub>Si<sub>2</sub>

C24H54O13Si2

Conditions
Conditions Yield
With copper(l) chloride; silicon; at 270 ℃; for 3h; Autoclave;
64%

2.What is the CAS number for TETRAKIS(ETHOXYETHOXY)SILANE ?

The CAS number of TETRAKIS(ETHOXYETHOXY)SILANE is 18407-94-8.

More information of TETRAKIS(ETHOXYETHOXY)SILANE 18407-94-8 are:

CAS?Number

 18407-94-8

Density

 1.013 g/cm3

Melting Point

 <0 °C

Boiling Point

 364.4 °C at 760 mmHg

Flash Point

 147.4 °C

Vapor Pressure

 3.54E-05mmHg at 25°C

Refractive Index

 1.434

HS CODE

 2920909090

PSA

 73.84000

LogP

 1.63440

3.What are another words for TETRAKIS(ETHOXYETHOXY)SILANE ?

Synonyms?for?TETRAKIS(ETHOXYETHOXY)SILANE 18407-94-8:Ethanol,2-ethoxy-, silicate (6CI);Ethanol, 2-ethoxy-, tetraester with silicic acid(H4SiO4) (8CI);2-Ethoxyethyl silicate;Tetraethoxyethyl orthosilicate;Tetrakis(2-ethoxyethyl) silicate;Tetrakis(ethoxyethoxy)silane;

4.What is the molecular formula of TETRAKIS(ETHOXYETHOXY)SILANE?

The chemical formula of ?TETRAKIS(ETHOXYETHOXY)SILANE is?C16H36O8Si which containing 16 Carbon atoms,36 Hydrogen atoms,8 Oxygen atoms and 1 Silicon atoms,and the molecular weight of??TETRAKIS(ETHOXYETHOXY)SILANE?is 384.543.

5.What is TETRAKIS(ETHOXYETHOXY)SILANE (18407-94-8) used for?

TETRAKIS(ETHOXYETHOXY)SILANE, also known as TEOS, is a colorless, odorless liquid chemical compound that is soluble in both organic solvents and water. It serves as a crucial precursor in the synthesis of silicon dioxide and various silicon-based materials, playing a significant role in the production of thin films for semiconductor and optical applications, as well as in the formulation of coatings, adhesives, and sealants.

InChI:InChI=1/C16H36O8Si/c1-5-17-9-13-21-25(22-14-10-18-6-2,23-15-11-19-7-3)24-16-12-20-8-4/h5-16H2,1-4H3

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